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دانلود کتاب Polymers for Microelectronics. Resists and Dielectrics
دانلود کتاب پلیمر برای میکروالکترونیک. مقاومت می کند و Dielectrics
مشخصات کتاب
Polymers for Microelectronics. Resists and Dielectrics
ویرایش: نویسندگان: Larry F. Thompson, C. Grant Willson, and Seiichi Tagawa (Eds.) سری: ACS Symposium Series 537 ISBN (شابک) : 9780841227217, 0841227217 ناشر: American Chemical Society سال نشر: 1994 تعداد صفحات: 569 زبان: English فرمت فایل : PDF (درصورت درخواست کاربر به PDF، EPUB یا AZW3 تبدیل می شود) حجم فایل: 46 مگابایت
قیمت کتاب (تومان) : 41,000
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توجه داشته باشید کتاب پلیمر برای میکروالکترونیک. مقاومت می کند و Dielectrics نسخه زبان اصلی می باشد و کتاب ترجمه شده به فارسی نمی باشد. وبسایت اینترنشنال لایبرری ارائه دهنده کتاب های زبان اصلی می باشد و هیچ گونه کتاب ترجمه شده یا نوشته شده به فارسی را ارائه نمی دهد.
توضیحاتی درمورد کتاب به خارجی
Content: Chemical amplification mechanisms for microlithography
/ E. Reichmanis, F.M. Houlihan, O. Nalamasu, and T.X. Neenan
--
Synthesis of 4-(tert-butoxycarbonyl)-2,6-dinitrobenzyl tosylate
: a potential generator and dissolution inhibitor solubilizable
through chemical amplification / F.M. Houlihan, E. Chin, O.
Nalamasu, and J.M. Kometani --
Chemically amplified deep-UV photoresists based on
acetal-protected poly(vinylphenols) / Ying Jiang and David R.
Bassett --
Novel analytic method of photoinduced acid generation and
evidence of photosensitization via matrix resin / N. Takeyama,
Y. Ueda, T. Kusumoto, H. Ueki, and M. Hanabata --
Acid-catalyzed dehydration : a new mechanism for chemically
amplified lithographic imaging / H. Ito, Y. Maekawa, R.
Sooriyakumaran, and E.A. Mash --
An alkaline-developable positive resist based on silylated
polyhydroxystyrene for KrF excimer laser lithography / Eiichi
Kobayashi, Makoto Murata, Mikio Yamachika, Yasutaka Kobayashi,
Yoshiji Yumoto, and Takao Miura --
A test for correlation between residual solvent and rates of
N-methylpyrrolidone absorption by polymer films / W.D.
Hinsberg, S.A. MacDonald, C.D. Snyder, H. Ito, and R.D. Allen
--
Dissolution rates of copolymers based on 4-hydroxystyrene and
styrene / C.-P. Lei, T. Long, S.K. Obendorf, and F. Rodriguez
--
Synthesis and polymerizations of N-(tert-butoxy)maleimide and
application of its polymers as a chemical amplification resist
/ Kwang-Duk Ahn and Deok-Il Koo --
Acid-sensitive pyrimidine polymers for chemical amplification
resists / Yoshiaki Inaki, Nobuo Matsumura, and Kiichi Takemoto
--
Methacrylate terpolymer approach in the design of a family of
chemically amplified positive resists / R.D. Allen, G.M.
Wallraff, W.D. Hinsberg, L.L. Simpson, and R.R. Kunz --
Surface-imaging resists using photogenerated acid-catalyzed
SiO₂ formation by chemical vapor deposition / Masamitsu Shirai
and Masahiro Tsunooka --
Polysilphenylenesiloxane resist with three-dimensional
structure / K. Watanabe, E. Yano, T. Namiki, and Y. Yoneda
--
Top-surface imaging using selective electroless metallization
of patterned monolayer films / J.M. Calvert, W.J. Dressick,
C.S. Dulcey, M.S. Chen, J.H. Georger, D.A. Stenger, T.S.
Koloski, and G.S. Calabrese --
Langmuir-Blodgett deposition to evaluate dissolution behavior
of multicomponent resists / V. Rao, W.D. Hinsberg, C.W. Frank,
and R.F.W. Pease --
Photochemical control of a morphology and solubility
transformation in poly(vinyl alcohol) films induced by
interfacial contact with siloxanes and phenol-formaldehyde
polymeric photoresists / James R. Sheats --
Advances in the chemistry of resists for ionizing radiation /
Ralph Dammel --
Out-of-plane expansion measurements in polyimide films /
Michael T. Pottiger and John C. Coburn --
Radiation-induced modifications of allylamino-substituted
polyphosphazenes / M.F. Welker, H.R. Allcock, G.L. Grune, R.T.
Chern, and V.T. Stannett --
Synthesis of perfluorinated polyimides for optical applications
/ Shinji Ando, Tohru Matsuura, and Shigekuni Sasaki --
Charged species in [sigma]-conjugated polysilanes as studied by
absorption spectroscopy with low-temperature matrices / K.
Ushida, A. Kira, S. Tagawa, Y. Yoshida, and H. Shibata --
Acid-sensitive phenol-formaldehyde polymeric resists / W.
Brunsvold, W. Conley, W. Montgomery, and W. Moreau --
Superiority of bis(perfluorophenyl) azides over nonfluorinated
analogues as cross-linkers in polystyrene-based deep-UV resists
/ Sui Xiong Cai, M.N. Wybourne, and John F.W. Keana --
New photoresponsive polymers bearing norbornadiene moiety :
synthesis by selective cationic polymerization of
2-(3-phenyl-2,5-norbornadiene-2-carbonyloxy)ethyl vinyl ether
and photochemical reaction of the resulting polymers / T.
Nishikubo, A. Kameyama, K. Kishi, and C. Hijikata --
Photoinitiated thermolysis of poly(5-norbornene
2,3-dicarboxylates) : a way to polyconjugated systems and
photoresists / Ernst Zenkl, Michael Schimetta, and Franz
Stelzer --
Recent progress of the application of polyimides to
microelectronics / Daisuke Makino --
Base-catalyzed cyclization of ortho-aromatic amide alkyl esters
: a novel approach to chemical imidization / W. Volksen, T.
Pascal, J.W. Labadie, and M.I. Sanchez --
Base-catalyzed photosensitive polyimide / D.R. McKean, G.M.
Wallraff, W. Volksen, N.P. Hacker, M.I. Sanchez, and J.W.
Labadie --
Novel cross-linking reagents based on
3,3-dimethyl-1-phenylenetriazene / Aldrich N.K. Lau and Lanchi
P. Vo --
Preparation of novel photosensitive polyimide systems via
long-lived active intermediates / Takahi Yamashita and Kazuyuki
Horie --
Photoregulation of liquid-crystalline orientation by
anisotropic photochromism of surface azobenzenes / Yuji
Kawanishi, Takashi Tamaki, and Kunihiro Ichimura --
Factors affecting the stability of polypyrrole films at higher
temperatures / V.-T. Truong and B.C. Ennis --
Intrinsic and thermal stress in polyimide thin films / M. Ree
and D.P. Kirby --
Fluorinated, soluble polyimides with high glass-transition
temperatures based on a new, rigid, pentacyclic dianhydride :
12,14-diphenyl-12,14-bis-(trifluoromethyl)-12H,14H-5,7-dioxapentacene-2,3,9,10-tetracarboxylic
dianhydride / Brian C. Auman and Swiatoslaw Trofimenko --
Processable fluorinated acrylic resins with low dielectric
constants / Henry S.-W. Hu and James R. Griffith --
Enhanced processing of poly(tetrafluoroethylene) for
microelectronics applications / Charles R. Davis and Frank D.
Egitto --
Fluorinated poly(arylene ethers) with low dielectric constants
/ Frank W. Mercer, David W. Duff, Timothy D. Goodman, and
Janusz B. Wojtowicz --
Microstructural characterization of thin polyimide films by
positron lifetime spectroscopy / A. Eftekhari, A.K. St. Clair,
D.M. Stoakley, Danny R. Sprinkle, and J.J. Singh --
Synthesis and characterization of new poly(arylene ether
oxadiazoles) / Frank W. Mercer, Chris Coffin, and David W.
Duff.
